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Thin amorphous silicon oxide ICPECVD layer on gold surface for surface plasmon resonance measurements.

Authors :
Herth, Etienne
Zeggari, Rabah
Rauch, Jean-Yves
Remy-Martin, Fabien
Boireau, Wilfrid
Source :
2015 IEEE International Interconnect Technology Conference & 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM); 2015, p83-86, 4p
Publication Year :
2015

Details

Language :
English
ISBNs :
9781467373562
Database :
Complementary Index
Journal :
2015 IEEE International Interconnect Technology Conference & 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM)
Publication Type :
Conference
Accession number :
111588248
Full Text :
https://doi.org/10.1109/IITC-MAM.2015.7325632