Assessing the use of reflectance spectroscopy in determining CsCl stress in the model species Arabidopsis thaliana.

Reflectance spectroscopy is a rapid and non-destructive analytical technique that may be used for assessing plant stress, and has potential applications for use in remediation. Changes in reflectance such as that due to metal stress may occur before damage is visible, and existing studies have shown that metal stress does cause changes in plant reflectance. To further investigate the potential use of reflectance spectroscopy as a method for assessing metal stress in plants, an exploratory study was conducted in whichArabidopsis thalianaplants were treated twice weekly in a laboratory setting with varying levels (0, 0.5, or 5 mM (millimolar)) of caesium chloride (CsCl) solution, and reflectance spectra were collected every week for three weeks using an Analytical Spectral Devices FieldSpec Pro spectroradiometer with both a contact probe (CP) and a field of view (FOV) probe at 36.8 and 66.7 cm, respectively, above the plant. Plants were harvested each week after spectra collection for determination of relative water content and chlorophyll content. A visual assessment of the plants was also conducted using point observations on a uniform grid of 81 points. A mixed-effects model analysis was conducted for each vegetation index (VI) considered to determine the effects of length of treatment, treatment level, view with which spectra were acquired, and the interactions of these terms. Two-way analyses of variance (ANOVAs) were performed on the aforementioned endpoints (e.g. chlorophyll content) to determine the significance of the effects of treatment level and length of treatment. Multiple linear regression (MLR) was used to develop a predictive model for each endpoint, considering VI acquired at each view (CP, high FOV, and low FOV). Of the 14 VI considered, 8 were included in the MLR models. Contact probe readings and FOV readings differed significantly, but FOV measurements were generally consistent at each height. [ABSTRACT FROM AUTHOR]