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Examination of interfacial charge transfer in photocatalysis using patterned CuO thin film deposited on TiO2.
- Source :
- APL Materials; 2015, Vol. 3 Issue 10, p104409-1-104409-5, 5p
- Publication Year :
- 2015
-
Abstract
- We examined the interfacial charge transfer effect on photocatalysts using a patterned CuO thin film deposited on a rutile TiO<subscript>2</subscript> (110) substrate. Photocatalytic activity was visualized based on the formation of metal Ag particles resulting from the photoreduction of Ag<superscript>+</superscript> ions under visible-light illumination. Ag particles were selectively deposited near the edge of CuO film for several nanometer thick CuO film, indicating that interfacial excitation from the valence band maximum of TiO<subscript>2</subscript> to the conduction band minimum of CuO plays a key role in efficient photocatalytic activity of CuO nanocluster-grafted TiO<subscript>2</subscript> systems with visible-light sensitivity [ABSTRACT FROM AUTHOR]
- Subjects :
- MARCUS-Hush relationship
FILM condensation
THIN film manufacturing
Subjects
Details
- Language :
- English
- ISSN :
- 2166532X
- Volume :
- 3
- Issue :
- 10
- Database :
- Complementary Index
- Journal :
- APL Materials
- Publication Type :
- Academic Journal
- Accession number :
- 110688383
- Full Text :
- https://doi.org/10.1063/1.4926934