TEM Investigation of the Surface Layer Structure [111]B2 of the Single NiTi Crystal Modified by the Si-Ion Beam Implantation.

The study was carried on for the single NiTi crystals subjected to the Si-ion beam implantation. Using the transmission electron microscopy technique (TEM), the surface layer structure [111]_B2 was examined for the treated material. The modified near-surface sublayers were found to have different composition. Thus the uppermost sublayer contained mostly oxides; the lower-lying modified sublayer material was in an amorphous state and the thin underlying sublayer had a defect structure. [ABSTRACT FROM AUTHOR]