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Tailoring the Two Dimensional Electron Gas at Polar ABO3/SrTiO3 Interfaces for Oxide Electronics.

Authors :
Li, Changjian
Liu, Zhiqi
Lü, Weiming
Wang, Xiao Renshaw
Annadi, Anil
Huang, Zhen
Zeng, Shengwei
Ariando
Venkatesan, T.
Source :
Scientific Reports; 8/28/2015, p13314, 1p
Publication Year :
2015

Abstract

The 2D electron gas at the polar/non-polar oxide interface has become an important platform for several novel oxide electronic devices. In this paper, the transport properties of a wide range of polar perovskite oxide ABO<subscript>3</subscript>/SrTiO<subscript>3</subscript> (STO) interfaces, where ABO<subscript>3</subscript> includes LaAlO<subscript>3</subscript>, PrAlO<subscript>3</subscript>, NdAlO<subscript>3</subscript>, NdGaO<subscript>3</subscript> and LaGaO<subscript>3</subscript> in both crystalline and amorphous forms, were investigated. A robust 4 unit cell (uc) critical thickness for metal insulator transition was observed for crystalline polar layer/STO interface while the critical thickness for amorphous ones was strongly dependent on the B site atom and its oxygen affinity. For the crystalline interfaces, a sharp transition to the metallic state (i.e. polarization catastrophe induced 2D electron gas only) occurs at a growth temperature of 515 °C which corresponds to a critical relative crystallinity of ~70 ± 10% of the LaAlO<subscript>3</subscript> overlayer. This temperature is generally lower than the metal silicide formation temperature and thus offers a route to integrate oxide heterojunction based devices on silicon. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
20452322
Database :
Complementary Index
Journal :
Scientific Reports
Publication Type :
Academic Journal
Accession number :
109167318
Full Text :
https://doi.org/10.1038/srep13314