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The new methodology of contact process window vericification.

Authors :
Fang, Yi-Lung
Li, Siao-Ling
Liao, Hsiang-Chou
Luoh, Tuung
Yang, Ling-Wu
Yang, Tahone
Chen, Kuang-Chao
Source :
2015 China Semiconductor Technology International Conference; 2015, p1-3, 3p
Publication Year :
2015

Details

Language :
English
ISBNs :
9781479972418
Database :
Complementary Index
Journal :
2015 China Semiconductor Technology International Conference
Publication Type :
Conference
Accession number :
108855485
Full Text :
https://doi.org/10.1109/CSTIC.2015.7153354