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Directed Self-Assembly of Poly(2-vinylpyridine)- b-polystyrene- b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template.
- Source :
- Advanced Materials; Aug2015, Vol. 27 Issue 29, p4364-4370, 7p
- Publication Year :
- 2015
Details
- Language :
- English
- ISSN :
- 09359648
- Volume :
- 27
- Issue :
- 29
- Database :
- Complementary Index
- Journal :
- Advanced Materials
- Publication Type :
- Academic Journal
- Accession number :
- 108698631
- Full Text :
- https://doi.org/10.1002/adma.201501585