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Bilayer Metal-Oxide CBRAM Technology for Improved Window Margin and Reliability.

Authors :
Barci, Marinela
Molas, Gabriel
Toffoli, Alain
Bernard, Mathieu
Roule, Anne
Cagli, Carlo
Cluzel, Jacques
Vianello, Elisa
De Salvo, Barbara
Perniola, Luca
Source :
2015 IEEE International Memory Workshop (IMW); 2015, p1-4, 4p
Publication Year :
2015

Details

Language :
English
ISBNs :
9781467369312
Database :
Complementary Index
Journal :
2015 IEEE International Memory Workshop (IMW)
Publication Type :
Conference
Accession number :
108575625
Full Text :
https://doi.org/10.1109/IMW.2015.7150278