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Single- and Multi-Directional Slanted Plasma Etching of Silicon under Practical Plasma Processing Conditions.
- Source :
- ECS Journal of Solid State Science & Technology; 2014, Vol. 3 Issue 11, pQ215-Q220, 6p
- Publication Year :
- 2014
Details
- Language :
- English
- ISSN :
- 21628769
- Volume :
- 3
- Issue :
- 11
- Database :
- Complementary Index
- Journal :
- ECS Journal of Solid State Science & Technology
- Publication Type :
- Academic Journal
- Accession number :
- 102649544
- Full Text :
- https://doi.org/10.1149/2.0091411jss