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Ordered domain lateral location, symmetry, and thermal stability in Ge:Si islands.

Authors :
Richard, M.-I.
Malachias, A.
Schülli, T. U.
Favre-Nicolin, V.
Zhong, Z.
Metzger, T. H.
Renaud, G.
Source :
Applied Physics Letters; 1/5/2015, Vol. 106 Issue 1, p1-4, 4p, 3 Graphs
Publication Year :
2015

Abstract

Compositional atomic ordering is a crucial issue in the epitaxial growth of nanoparticles and thin films. Here, we report on a method based on x-ray diffuse scattering close to basis forbidden Bragg reflections to infer the lateral location, the symmetry, and the thermal stability of ordered domains in GeSi dome-shaped islands on Si(001) after growth and during annealing. We observe that atomic ordering does not disappear after annealing, demonstrating that it is a resilient metastable phenomenon. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
106
Issue :
1
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
100416912
Full Text :
https://doi.org/10.1063/1.4905844