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Improved cut-resistance of Kevlar® using controlled interface reactions during atomic layer deposition of ultrathin (<50 °A) inorganic coatings[†].
- Source :
- Journal of Materials Chemistry A; 2014, Vol. 2 Issue 41, p17371-17379, 9p, 1 Color Photograph, 4 Black and White Photographs, 1 Diagram, 1 Chart, 5 Graphs
- Publication Year :
- 2014
-
Abstract
- Conformal atomic layer deposition (ALD) of Al<subscript>2</subscript>O<subscript>3</subscript> and TiO<subscript>2</subscript> thin films on Kevlar®, poly(p-phenylene terephthalamide) (PPTA) fibers at 50 and 100 °C affects the fiber cut resistance. Systematic studies of ALD coatings between 10 to 400 A thick formed at 50 and 100 °C revealed excellent conformality, and trends in cutting performance depended on materials and process details. Å 50 Å/50 Å TiO<subscript>2</subscript>/Al<subscript>2</subscript>O<subscript>3</subscript> bilayer formed at 50 °C increased cut resistance of PPTA by 30% compared to untreated fiber materials. In situ infrared analysis shows that trimethylaluminum (TMA) Al<subscript>2</subscript>O<subscript>3</subscript> precursor reacts sub-surface with PPTA and tends to degraded mechanical performance. The TiCl<subscript>4</subscript> TiO<subscript>2</subscript> precursor reacts to form a barrier that limits TMA/PPTA interactions, allowing a harder Al<subscript>2</subscript>O<subscript>3</subscript> layer to form on top of TiO<subscript>2</subscript>. The thin ALD coatings do not substantially affect durability, flexibility, or weight of the PPTA, making ALD a potentially viable means to enhance the protective properties of Kevlar and other polymer fiber systems. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 20507488
- Volume :
- 2
- Issue :
- 41
- Database :
- Complementary Index
- Journal :
- Journal of Materials Chemistry A
- Publication Type :
- Academic Journal
- Accession number :
- 100342722
- Full Text :
- https://doi.org/10.1039/c4ta03662j