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Lead- and alkali-metal-free BaTiO3–Bi(Mg0.5Ti0.5)O3–BiFeO3 solid-solution thin films with high dielectric constant prepared on Si substrates by solution-based method.

Authors :
Junichi Kimura
Chentir Mohamed-Tahar
Takao Shimizu
Hiroshi Uchida
Hiroshi Funakubo
Source :
Japanese Journal of Applied Physics; Sep2014, Vol. 53 Issue 9S, p1-1, 1p
Publication Year :
2014

Abstract

Lead- and alkali-metal-free BaTiO<subscript>3</subscript>–Bi(Mg<subscript>0.5</subscript>Ti<subscript>0.5</subscript>)O<subscript>3</subscript>–BiFeO<subscript>3</subscript> solid-solution thin films were prepared on (111)<subscript>c</subscript>SrRuO<subscript>3</subscript>/(111)Pt/TiO<subscript>2</subscript>/SiO<subscript>2</subscript>/(100)Si substrates by chemical solution deposition (CSD) and their crystal structure and dielectric properties were investigated. The lattice spacing as a function of z/(x + z) in xBaTiO<subscript>3</subscript>–0.1Bi(Mg<subscript>0.5</subscript>Ti<subscript>0.5</subscript>)O<subscript>3</subscript>–zBiFeO<subscript>3</subscript> indicated the existence of phase boundaries (pseudocubic/rhombohedral) in the range of z/(x + z) = 0.33–0.56, where the relatively high relative dielectric constant, ε<subscript>r</subscript>, of above 800 was obtained. On the other hand, dielectric loss, tan δ, of below 0.2 was confirmed in the range z/(x + z) = 0–0.87, which rapidly increased toward z/(x + z) = 1.0. The relatively high ε<subscript>r</subscript> values of these films deposited on Si substrates by a solution-based process suggest that they can be used as alternative to Pb(Zr,Ti)O<subscript>3</subscript>, KNbO<subscript>3</subscript>, and (Bi<subscript>1/2</subscript>Na<subscript>1/2</subscript>)TiO<subscript>3</subscript>-based films. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00214922
Volume :
53
Issue :
9S
Database :
Complementary Index
Journal :
Japanese Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
100233456
Full Text :
https://doi.org/10.7567/JJAP.53.09PA12