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Structural and Magnetic Properties of Co2MnSi Heusler Alloy Thin Films on Si.

Authors :
Nahid, Muhammad Ariful Islam
Oogane, Mikihiko
Naganuma, Hiroshi
Ando, Yasuo
Source :
Japanese Journal of Applied Physics; Aug2009, Vol. 48 Issue 8R, p1-1, 1p
Publication Year :
2009

Abstract

The structural and magnetic properties of Co<subscript>2</subscript>MnSi thin films grown on n-doped Si(110) and Si(100) substrates were studied and observed to have a strong dependence on annealing temperature (T<subscript>A</subscript>). At T<subscript>A</subscript>=275–350 °C, the Co<subscript>2</subscript>MnSi films exhibited the B2 phase with a <100> orientation and a magnetic moment on both substrates. The saturation magnetization (M<subscript>S</subscript>) of Co<subscript>2</subscript>MnSi thin films was observed to reach a maximum at T<subscript>A</subscript>=300 °C, above which it was found to decrease. We consider that at T<subscript>A</subscript>≃300 °C, the Co<subscript>2</subscript>MnSi thin films on Si substrates exhibited the <100> orientation, a high M<subscript>S</subscript> and a low roughness which might promote spin injection. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00214922
Volume :
48
Issue :
8R
Database :
Complementary Index
Journal :
Japanese Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
100175881
Full Text :
https://doi.org/10.1143/JJAP.48.083002