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Design, Fabrication, and Implantation of Invasive Microelectrode Arrays as in vivo Brain Machine Interfaces: A Comprehensive Review.

Authors :
Yi D
Yao Y
Wang Y
Chen L
Source :
Journal of manufacturing processes [J Manuf Process] 2024 Sep 30; Vol. 126, pp. 185-207. Date of Electronic Publication: 2024 Jul 31.
Publication Year :
2024

Abstract

Invasive Microelectrode Arrays (MEAs) have been a significant and useful tool for us to gain a fundamental understanding of how the brain works through high spatiotemporal resolution neuron-level recordings and/or stimulations. Through decades of research, various types of microwire, silicon, and flexible substrate-based MEAs have been developed using the evolving new materials, novel design concepts, and cutting-edge advanced manufacturing capabilities. Surgical implantation of the latest minimal damaging flexible MEAs through the hard-to-penetrate brain membranes introduces new challenges and thus the development of implantation strategies and instruments for the latest MEAs. In this paper, studies on the design considerations and enabling manufacturing processes of various invasive MEAs as in vivo brain-machine interfaces have been reviewed to facilitate the development as well as the state-of-art of such brain-machine interfaces from an engineering perspective. The challenges and solution strategies developed for surgically implanting such interfaces into the brain have also been evaluated and summarized. Finally, the research gaps have been identified in the design, manufacturing, and implantation perspectives, and future research prospects in invasive MEA development have been proposed.<br />Competing Interests: Declaration of interests The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.

Details

Language :
English
ISSN :
1526-6125
Volume :
126
Database :
MEDLINE
Journal :
Journal of manufacturing processes
Publication Type :
Academic Journal
Accession number :
39185373
Full Text :
https://doi.org/10.1016/j.jmapro.2024.07.100