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All-2D-Materials Subthreshold-Free Field-Effect Transistor with Near-Ideal Switching Slope.

Authors :
Hu J
Li H
Chen A
Zhang Y
Wang H
Fu Y
Zhou X
Loh KP
Kang Y
Chai J
Wang C
Zhou J
Miao J
Zhao Y
Zhong S
Zhao R
Liu K
Xu Y
Yu B
Source :
ACS nano [ACS Nano] 2024 Jul 29. Date of Electronic Publication: 2024 Jul 29.
Publication Year :
2024
Publisher :
Ahead of Print

Abstract

The Boltzmann Tyranny, set by thermionic statistics, dictates the lower limit of switching slope (SS) of a MOSFET to be 60 mV/dec, the fundamental barrier for low-dissipative electronics. The large SS leads to nonscalable voltage, significant leakage, and power consumption, particularly at short channels, making transistor scaling an intimidating challenge. In recent decades, an array of steep-slope transistors has been proposed; none is close to an ideal switch with ultimately abrupt switching (SS ∼ 0 mV/dec) between the binary logic states. We demonstrated an all-2D-materials van-der-Waals-heterostructure (vdW)-based FET that exhibits ultrasteep switching (0.33 mV/dec), a large on/off current ratio (∼10 <superscript>7</superscript> ), and an ultralow off current (∼0.1 pA). The "Subthreshold-Free" operation achieved by the collective behavior of functional materials enables FET switching directly from the OFF-state to the ON-state with entirely eliminated subthreshold region, behaving as the ideal logic switch. Two-inch wafer-scale device fabrication is demonstrated. Boosted by device innovation and emerging materials, the research presents an advancement in achieving the "beyond-Boltzmann" transistors, overcoming one of the CMOS electronics' most infamous technology barriers that have plagued the research community for decades.

Details

Language :
English
ISSN :
1936-086X
Database :
MEDLINE
Journal :
ACS nano
Publication Type :
Academic Journal
Accession number :
39073870
Full Text :
https://doi.org/10.1021/acsnano.4c03856