Increase of secondary metabolites in sweet basil (Ocimum basilicum L.) leaves by exposure to N 2 O 5 with plasma technology.

MLA

Tateishi, Rie, et al. “Increase of Secondary Metabolites in Sweet Basil (Ocimum Basilicum L.) Leaves by Exposure to N 2 O 5 with Plasma Technology.” Scientific Reports, vol. 14, no. 1, June 2024, p. 12759. EBSCOhost, https://doi.org/10.1038/s41598-024-63508-8.

APA

Tateishi, R., Ogawa-Kishida, N., Fujii, N., Nagata, Y., Ohtsubo, Y., Sasaki, S., Takashima, K., Kaneko, T., & Higashitani, A. (2024). Increase of secondary metabolites in sweet basil (Ocimum basilicum L.) leaves by exposure to N 2 O 5 with plasma technology. Scientific Reports, 14(1), 12759. https://doi.org/10.1038/s41598-024-63508-8

Chicago

Tateishi, Rie, Natsumi Ogawa-Kishida, Nobuharu Fujii, Yuji Nagata, Yoshiyuki Ohtsubo, Shota Sasaki, Keisuke Takashima, Toshiro Kaneko, and Atsushi Higashitani. 2024. “Increase of Secondary Metabolites in Sweet Basil (Ocimum Basilicum L.) Leaves by Exposure to N 2 O 5 with Plasma Technology.” Scientific Reports 14 (1): 12759. doi:10.1038/s41598-024-63508-8.