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Improving Carbon Nanotube-Based Radiofrequency Field-Effect Transistors by the Device Architecture and Doping Process.

Authors :
Ren L
Zhou J
Pan Z
Li H
Ding L
Zhang Z
Peng LM
Source :
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2024 Mar 13; Vol. 16 (10), pp. 12813-12820. Date of Electronic Publication: 2024 Feb 27.
Publication Year :
2024

Abstract

The semiconducting carbon nanotube (CNT) has been considered a promising candidate for future radiofrequency (RF) electronics due to its excellent electrical properties of high mobility and small capacitance. After decades of development, great progress has been achieved on CNT-based RF field-effect transistors (FETs). However, almost all elevations are owing to advancement of the CNT materials and fabrication process, while the study of device architecture is seldom considered and reported. In this work, we innovatively combined device architecture and related doping processes to further optimize CNT-based RF FETs by guiding process or materials with collaborative optimization for the first time and explore their effect on device performance carefully and statistically. Based on more mature random-oriented CNT materials, we fabricated CNT-based RF FETs having three different gate positions of device architecture variation accompanied by suitable doping schemes. The optimized FETs obtained 2-3 times of current density (transconductance) and 1.3 times the cutoff frequency and maximum oscillation frequency compared with unoptimized devices at the same channel length. After transistor-level verification of effect, we further built a CNT RF amplifier and demonstrated almost 10 dB of transducer gain improvement operating at 8 GHz for X-band application. The achieved results from this work would help further improve CNT RF performance beyond the materials and process point of view.

Details

Language :
English
ISSN :
1944-8252
Volume :
16
Issue :
10
Database :
MEDLINE
Journal :
ACS applied materials & interfaces
Publication Type :
Academic Journal
Accession number :
38412248
Full Text :
https://doi.org/10.1021/acsami.3c19479