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An Investigation of the Non-selective Etching of Synthetic Polymers by Electrospray Droplet Impact/Secondary Ion Mass Spectrometry (EDI/SIMS).
- Source :
-
Mass spectrometry (Tokyo, Japan) [Mass Spectrom (Tokyo)] 2023; Vol. 12 (1), pp. A0114. Date of Electronic Publication: 2023 Jan 31. - Publication Year :
- 2023
-
Abstract
- Among the various types of cluster secondary ion mass spectrometry (SIMS), electrospray droplet impact/secondary ion mass spectrometry (EDI/SIMS) is unique due to its high ionization efficiency and non-selective atomic/molecular-level surface etching ability. In this study, EDI/SIMS was applied to the non-selective etching of synthetic polymers of polystyrene (PS) and poly(9,9-di- n -octylfluonyl-2,7diyl) (PFO) deposited on a silicon substrate. The polymers gave characteristic fragment ions and the mass spectra remained unchanged with prolonged EDI irradiation time, indicating that non-selective etching can be achieved by EDI irradiation, a finding that is consistent with our previous reports based on EDI/X-ray photoelectron spectroscopy analyses. From the irradiation time and film thickness, the etching rates for PS and PFO were roughly estimated to be 0.6 nm/min and 0.15 nm/min, respectively, under the experimental conditions that were used. After the depletion of polymer sample on the surface, ion signals originating from the exposed silicon substrate were observed. This indicates that EDI/SIMS is applicable to the analysis of the interface of multilayered films composed of organic and inorganic materials.<br /> (Copyright © 2023 Kenzo Hiraoka, Yuji Sakai, Hiroyuki Kubota, Satoshi Ninomiya, and Stephanie Rankin-Turner.)
Details
- Language :
- English
- ISSN :
- 2187-137X
- Volume :
- 12
- Issue :
- 1
- Database :
- MEDLINE
- Journal :
- Mass spectrometry (Tokyo, Japan)
- Publication Type :
- Academic Journal
- Accession number :
- 37250594
- Full Text :
- https://doi.org/10.5702/massspectrometry.A0114