Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning.

MLA

Wang, Chang-Ming, et al. “Gap-Directed Chemical Lift-off Lithographic Nanoarchitectonics for Arbitrary Sub-Micrometer Patterning.” Beilstein Journal of Nanotechnology, vol. 14, Jan. 2023, pp. 34–44. EBSCOhost, https://doi.org/10.3762/bjnano.14.4.

APA

Wang, C.-M., Chan, H.-S., Liao, C.-L., Chang, C.-W., & Liao, W.-S. (2023). Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning. Beilstein Journal of Nanotechnology, 14, 34–44. https://doi.org/10.3762/bjnano.14.4

Chicago

Wang, Chang-Ming, Hong-Sheng Chan, Chia-Li Liao, Che-Wei Chang, and Wei-Ssu Liao. 2023. “Gap-Directed Chemical Lift-off Lithographic Nanoarchitectonics for Arbitrary Sub-Micrometer Patterning.” Beilstein Journal of Nanotechnology 14 (January): 34–44. doi:10.3762/bjnano.14.4.