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Molybdenum precursor delivery approaches in atomic layer deposition of α-MoO 3 .
- Source :
-
Dalton transactions (Cambridge, England : 2003) [Dalton Trans] 2023 Jan 24; Vol. 52 (4), pp. 902-908. Date of Electronic Publication: 2023 Jan 24. - Publication Year :
- 2023
-
Abstract
- In this research work, we present a study on time-sequenced plasma-enhanced atomic layer deposition (PE-ALD) processes towards the achievement of high-quality α-MoO <subscript>3</subscript> thin films which are suitable for exfoliation. In particular, a conventional precursor injection method along with a boosted precursor delivery approach are discussed and analysed. In the latter, the proposed gas supply mechanism ensures a large number of deposited Mo atoms per unit of time, which, along with a proper thermal energy, leads to high-quality and oriented orthorhombic α-MoO <subscript>3</subscript> films. The proposed boosted approach is also compared with post growth annealing steps, resulting in more effective achievement of a highly oriented orthorhombic α-MoO <subscript>3</subscript> phase and less time consumption.
- Subjects :
- Molybdenum
Hot Temperature
Subjects
Details
- Language :
- English
- ISSN :
- 1477-9234
- Volume :
- 52
- Issue :
- 4
- Database :
- MEDLINE
- Journal :
- Dalton transactions (Cambridge, England : 2003)
- Publication Type :
- Academic Journal
- Accession number :
- 36504121
- Full Text :
- https://doi.org/10.1039/d2dt03702e