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Self-driven carbon atom implantation into fullerene embedding metal-carbon cluster.
- Source :
-
Proceedings of the National Academy of Sciences of the United States of America [Proc Natl Acad Sci U S A] 2022 Sep 27; Vol. 119 (39), pp. e2202563119. Date of Electronic Publication: 2022 Sep 19. - Publication Year :
- 2022
-
Abstract
- Hundreds of members have been synthesized and versatile applications have been promised for endofullerenes (EFs) in the past 30 y. However, the formation mechanism of EFs is still a long-standing puzzle to chemists, especially the mechanism of embedding clusters into charged carbon cages. Here, based on synthesis and structures of two representative vanadium-scandium-carbido/carbide EFs, VSc <subscript>2</subscript> C@ I <subscript>h</subscript> (7)-C <subscript>80</subscript> and VSc <subscript>2</subscript> C <subscript>2</subscript> @ I <subscript>h</subscript> (7)-C <subscript>80</subscript> , a reasonable mechanism-C <subscript>1</subscript> implantation (a carbon atom is implanted into carbon cage)-is proposed to interpret the evolution from VSc <subscript>2</subscript> C carbido to VSc <subscript>2</subscript> C <subscript>2</subscript> carbide cluster. Supported by theoretical calculations together with crystallographic characterization, the single electron on vanadium (V) in VSc <subscript>2</subscript> C@ I <subscript>h</subscript> (7)-C <subscript>80</subscript> is proved to facilitate the C <subscript>1</subscript> implantation. While the V=C double bond is identified for VSc <subscript>2</subscript> C@ I <subscript>h</subscript> (7)-C <subscript>80</subscript> , after C <subscript>1</subscript> implantation the distance between V and C atoms in VSc <subscript>2</subscript> C <subscript>2</subscript> @ I <subscript>h</subscript> (7)-C <subscript>80</subscript> falls into the range of single bond lengths as previously shown in typical V-based organometallic complexes. This work exemplifies in situ self-driven implantation of an outer carbon atom into a charged carbon cage, which is different from previous heterogeneous implantation of nonmetal atoms (Group-V or -VIII atoms) driven by high-energy ion bombardment or high-pressure offline, and the proposed C <subscript>1</subscript> implantation mechanism represents a heretofore unknown metal-carbon cluster encapsulation mechanism and can be the fundamental basis for EF family genesis.
Details
- Language :
- English
- ISSN :
- 1091-6490
- Volume :
- 119
- Issue :
- 39
- Database :
- MEDLINE
- Journal :
- Proceedings of the National Academy of Sciences of the United States of America
- Publication Type :
- Academic Journal
- Accession number :
- 36122234
- Full Text :
- https://doi.org/10.1073/pnas.2202563119