Atomic Layer Deposition of Metal Oxides and Chalcogenides for High Performance Transistors.

MLA

Shen, Chengxu, et al. “Atomic Layer Deposition of Metal Oxides and Chalcogenides for High Performance Transistors.” Advanced Science (Weinheim, Baden-Wurttemberg, Germany), vol. 9, no. 23, Aug. 2022, p. e2104599. EBSCOhost, https://doi.org/10.1002/advs.202104599.

APA

Shen, C., Yin, Z., Collins, F., & Pinna, N. (2022). Atomic Layer Deposition of Metal Oxides and Chalcogenides for High Performance Transistors. Advanced Science (Weinheim, Baden-Wurttemberg, Germany), 9(23), e2104599. https://doi.org/10.1002/advs.202104599

Chicago

Shen, Chengxu, Zhigang Yin, Fionn Collins, and Nicola Pinna. 2022. “Atomic Layer Deposition of Metal Oxides and Chalcogenides for High Performance Transistors.” Advanced Science (Weinheim, Baden-Wurttemberg, Germany) 9 (23): e2104599. doi:10.1002/advs.202104599.