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High- k perovskite gate oxide for modulation beyond 10 14 cm -2 .
- Source :
-
Science advances [Sci Adv] 2022 Mar 18; Vol. 8 (11), pp. eabm3962. Date of Electronic Publication: 2022 Mar 18. - Publication Year :
- 2022
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Abstract
- Scaling down of semiconductor devices requires high- k dielectric materials to continue lowering the operating voltage of field-effect transistors (FETs) and storing sufficient charge on a smaller area. Here, we investigate the dielectric properties of epitaxial BaHf <subscript>0.6</subscript> Ti <subscript>0.4</subscript> O <subscript>3</subscript> (BHTO), an alloy of perovskite oxide barium hafnate (BaHfO <subscript>3</subscript> ) and barium titanate (BaTiO <subscript>3</subscript> ). We found the dielectric constant, the breakdown field, and the leakage current to be 150, 5.0 megavolts per centimeter (MV cm <superscript>-1</superscript> ), and 10 <superscript>-4</superscript> amperes per square centimeter at 2 MV cm <superscript>-1</superscript> , respectively. The results suggest that two-dimensional (2D) carrier density of more than n <subscript>2D</subscript> = 10 <superscript>14</superscript> per square centimeter (cm <superscript>-2</superscript> ) could be modulated by the BHTO gate oxide. We demonstrate an n-type accumulation mode FET and direct suppression of more than n <subscript>2D</subscript> = 10 <superscript>14</superscript> cm <superscript>-2</superscript> via an n-type depletion-mode FET. We attribute the large dielectric constant, high breakdown field, and low leakage current of BHTO to the nanometer scale stoichiometric modulation of hafnium and titanium.
Details
- Language :
- English
- ISSN :
- 2375-2548
- Volume :
- 8
- Issue :
- 11
- Database :
- MEDLINE
- Journal :
- Science advances
- Publication Type :
- Academic Journal
- Accession number :
- 35302844
- Full Text :
- https://doi.org/10.1126/sciadv.abm3962