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Gettering in PolySi/SiO x Passivating Contacts Enables Si-Based Tandem Solar Cells with High Thermal and Contamination Resilience.

Authors :
Assar A
Martinho F
Larsen J
Saini N
Shearer D
Moro MV
Stulen F
Grini S
Engberg S
Stamate E
Schou J
Vines L
Canulescu S
Platzer-Björkman C
Hansen O
Source :
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2022 Mar 30; Vol. 14 (12), pp. 14342-14358. Date of Electronic Publication: 2022 Mar 17.
Publication Year :
2022

Abstract

Multijunction solar cells in a tandem configuration could further lower the costs of electricity if crystalline Si (c-Si) is used as the bottom cell. However, for direct monolithic integration on c-Si, only a restricted number of top and bottom cell architectures are compatible, due to either epitaxy or high-temperature constraints, where the interface between subcells is subject to a trade-off between transmittance, electrical interconnection, and bottom cell degradation. Using polySi/SiO <subscript>x</subscript> passivating contacts for Si, this degradation can be largely circumvented by tuning the polySi/SiO <subscript>x</subscript> stacks to promote gettering of contaminants admitted into the Si bottom cell during the top cell synthesis. Applying this concept to the low-cost top cell chalcogenides Cu <subscript>2</subscript> ZnSnS <subscript>4</subscript> (CZTS), CuGaSe <subscript>2</subscript> (CGSe), and AgInGaSe <subscript>2</subscript> (AIGSe), fabricated under harsh S or Se atmospheres above 550 °C, we show that increasing the heavily doped polySi layer thickness from 40 to up to 400 nm prevents a reduction in Si carrier lifetime by 1 order of magnitude, with final lifetimes above 500 μs uniformly across areas up to 20 cm <superscript>2</superscript> . In all cases, the increased resilience was correlated with a 99.9% reduction in contaminant concentration in the c-Si bulk, provided by the thick polySi layer, which acts as a buried gettering layer in the tandem structure without compromising the Si passivation quality. The Si resilience decreased as AIGSe > CGSe > CZTS, in accordance with the measured Cu contamination profiles and higher annealing temperatures. An efficiency of up to 7% was achieved for a CZTS/Si tandem, where the Si bottom cell is no longer the limiting factor.

Details

Language :
English
ISSN :
1944-8252
Volume :
14
Issue :
12
Database :
MEDLINE
Journal :
ACS applied materials & interfaces
Publication Type :
Academic Journal
Accession number :
35297597
Full Text :
https://doi.org/10.1021/acsami.2c00319