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High Hole Concentration and Diffusion Suppression of Heavily Mg-Doped p-GaN for Application in Enhanced-Mode GaN HEMT.
- Source :
-
Nanomaterials (Basel, Switzerland) [Nanomaterials (Basel)] 2021 Jul 07; Vol. 11 (7). Date of Electronic Publication: 2021 Jul 07. - Publication Year :
- 2021
-
Abstract
- The effect of Mg doping on the electrical and optical properties of the p-GaN/AlGaN structures on a Si substrate grown by metal organic chemical vapor deposition was investigated. The Hall measurement showed that the activation efficiency of the sample with a 450 sccm Cp <subscript>2</subscript> Mg flow rate reached a maximum value of 2.22%. No reversion of the hole concentration was observed due to the existence of stress in the designed sample structures. This is attributed to the higher Mg-to-Ga incorporation rate resulting from the restriction of self-compensation under compressive strain. In addition, by using an AlN interlayer (IL) at the interface of p-GaN/AlGaN, the activation rate can be further improved after the doping concentration reaches saturation, and the diffusion of Mg atoms can also be effectively suppressed. A high hole concentration of about 1.3 × 10 <superscript>18</superscript> cm <superscript>-3</superscript> can be achieved in the p-GaN/AlN-IL/AlGaN structure.
Details
- Language :
- English
- ISSN :
- 2079-4991
- Volume :
- 11
- Issue :
- 7
- Database :
- MEDLINE
- Journal :
- Nanomaterials (Basel, Switzerland)
- Publication Type :
- Academic Journal
- Accession number :
- 34361152
- Full Text :
- https://doi.org/10.3390/nano11071766