Back to Search Start Over

Enhanced interfacial reaction of silicon carbide fillers onto the metal substrate in carbon nanotube paste for reliable field electron emitters.

Authors :
Go E
Kim JW
Lee JW
Ahn Y
Jeong JW
Kang JT
Park S
Yun KN
Kim SJ
Kim S
Yeon JH
Song YH
Source :
Nanotechnology [Nanotechnology] 2021 May 07; Vol. 32 (19), pp. 190001.
Publication Year :
2021

Abstract

Adhesion of carbon nanotube (CNT) onto a cathode substrate is very crucial for field electron emitters that are operating under high electric fields. As a supporting precursor of CNT field emitters, we adopted silicon carbide (SiC) nano-particle fillers with Ni particles and then enhanced interfacial reactions onto Kovar-alloy substrates through the optimized wet pulverization process of SiC aggregates for reliable field electron emitters. As-purchased SiC aggregates were efficiently pulverized from 20 to less than 1 micro-meter in a median value (D50). CNT pastes for field emitters were distinctively formulated by a mixing process of the pulverized SiC aggregates and pre-dispersed CNTs. X-ray photoelectron spectroscopy studies showed that the optimally pulverized SiC-CNT paste-emitter had a stronger Si 2p <superscript>3/2</superscript> signal in the Ni <subscript>2</subscript> Si phase than the as-purchased one. The Si 2p <superscript>3/2</superscript> signal would represent interfacial reaction of the SiC nano-particle onto Ni from the CNT paste and the Kovar substrate, forming the supporting layer for CNT emitters. The optimal paste-emitter even in a vacuum-sealed tube exhibited a highly reliable field emission current with a high current density of 100 mA cm <superscript>-2</superscript> for over 50 h along with good reproducibility. The enhanced interfacial reaction of SiC filler onto the metal substrates could lead to highly reliable field electron emitters for vacuum electronic devices.

Details

Language :
English
ISSN :
1361-6528
Volume :
32
Issue :
19
Database :
MEDLINE
Journal :
Nanotechnology
Publication Type :
Academic Journal
Accession number :
33524956
Full Text :
https://doi.org/10.1088/1361-6528/abe1ef