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Compliance current controlled volatile and nonvolatile memory in Ag/CoFe 2 O 4 /Pt resistive switching device.

Authors :
Munjal S
Khare N
Source :
Nanotechnology [Nanotechnology] 2021 Apr 30; Vol. 32 (18), pp. 185204.
Publication Year :
2021

Abstract

We report on the resistive memory effects of a Ag/CoFe <subscript>2</subscript> O <subscript>4</subscript> /Pt device and a deterministic conversion between volatile and nonvolatile resistive switching (RS) memory through the tuning of current compliance (I <subscript>CC</subscript> ). For the smaller I <subscript>CC</subscript> (10 <superscript>-4</superscript> A) the device exhibits volatile RS behavior with an atomically sized conducting filament showing the quantum conductance. For an intermediate I <subscript>CC</subscript> (10 <superscript>-2</superscript> A) nonvolatile bipolar RS behavior is observed, which could originate from the formation and rupture of filament consisting of Ag ions. The high resistance state (HRS) of the device shows a semiconducting conduction mechanism, whereas the low resistance state (LRS) was found to be Ohmic in nature. The temperature dependent resistance studies and magnetization studies indicated that the electrochemical metallization plays a dominant role in the resistive switching process for volatile and nonvolatile modes through the formation of Ag conducting filaments. For higher I <subscript>CC</subscript> (10 <superscript>-1</superscript> A) the device permanently switches to LRS. The irreversible RS memory behaviors, observed for higher I <subscript>CC</subscript> , could be attributed to the formation of a thick and stable conducting channel formed of oxygen vacancies and Ag ions. The compliance current controlled resistive switching modes with a large memory window make the present device a potential candidate to pave the way for future resistive switching devices.

Details

Language :
English
ISSN :
1361-6528
Volume :
32
Issue :
18
Database :
MEDLINE
Journal :
Nanotechnology
Publication Type :
Academic Journal
Accession number :
33470980
Full Text :
https://doi.org/10.1088/1361-6528/abdd5f