Facile production of ultra-fine silicon nanoparticles.

Authors :: Tokarska K
Shi Q
Otulakowski L
Wrobel P
Ta HQ
Kurtyka P
Kordyka A
Siwy M
Vasylieva M
Forys A
Trzebicka B
Bachmatiuk A
Rümmeli MH
Source :: Royal Society open science [R Soc Open Sci] 2020 Sep 16; Vol. 7 (9), pp. 200736. Date of Electronic Publication: 2020 Sep 16 (Print Publication: 2020).
Publication Year :: 2020
Abstract: A facile procedure for the synthesis of ultra-fine silicon nanoparticles without the need for a Schlenk vacuum line is presented. The process consists of the production of a (HSiO <subscript>1.5</subscript> ) <subscript>n</subscript> sol-gel precursor based on the polycondensation of low-cost trichlorosilane (HSiCl <subscript>3</subscript> ), followed by its annealing and etching. The obtained materials were thoroughly characterized after each preparation step by electron microscopy, Fourier transform and Raman spectroscopy, X-ray dispersion spectroscopy, diffraction methods and photoluminescence spectroscopy. The data confirm the formation of ultra-fine silicon nanoparticles with controllable average diameters between 1 and 5 nm depending on the etching time.<br />Competing Interests: The authors declare that they have no competing interests.<br /> (© 2020 The Authors.)