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A general approach for hysteresis-free, operationally stable metal halide perovskite field-effect transistors.

Authors :
Senanayak SP
Abdi-Jalebi M
Kamboj VS
Carey R
Shivanna R
Tian T
Schweicher G
Wang J
Giesbrecht N
Di Nuzzo D
Beere HE
Docampo P
Ritchie DA
Fairen-Jimenez D
Friend RH
Sirringhaus H
Source :
Science advances [Sci Adv] 2020 Apr 10; Vol. 6 (15), pp. eaaz4948. Date of Electronic Publication: 2020 Apr 10 (Print Publication: 2020).
Publication Year :
2020

Abstract

Despite sustained research, application of lead halide perovskites in field-effect transistors (FETs) has substantial concerns in terms of operational instabilities and hysteresis effects which are linked to its ionic nature. Here, we investigate the mechanism behind these instabilities and demonstrate an effective route to suppress them to realize high-performance perovskite FETs with low hysteresis, high threshold voltage stability (ΔV <subscript>t</subscript> < 2 V over 10 hours of continuous operation), and high mobility values >1 cm <superscript>2</superscript> /V·s at room temperature. We show that multiple cation incorporation using strain-relieving cations like Cs and cations such as Rb, which act as passivation/crystallization modifying agents, is an effective strategy for reducing vacancy concentration and ion migration in perovskite FETs. Furthermore, we demonstrate that treatment of perovskite films with positive azeotrope solvents that act as Lewis bases (acids) enables a further reduction in defect density and substantial improvement in performance and stability of n-type (p-type) perovskite devices.<br /> (Copyright © 2020 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works. Distributed under a Creative Commons Attribution NonCommercial License 4.0 (CC BY-NC).)

Details

Language :
English
ISSN :
2375-2548
Volume :
6
Issue :
15
Database :
MEDLINE
Journal :
Science advances
Publication Type :
Academic Journal
Accession number :
32300658
Full Text :
https://doi.org/10.1126/sciadv.aaz4948