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The Fundamental Mechanism Behind Colossal Permittivity in Oxides.

Authors :
Taylor NT
Davies FH
Davies SG
Price CJ
Hepplestone SP
Source :
Advanced materials (Deerfield Beach, Fla.) [Adv Mater] 2019 Dec; Vol. 31 (51), pp. e1904746. Date of Electronic Publication: 2019 Oct 21.
Publication Year :
2019

Abstract

Colossal permittivity materials exhibit extreme polarization in an applied electric field, providing applications in electronics and energy transmission. Understanding the atomic-scale mechanism behind colossal permittivity remains a challenging task and is key to optimizing materials with this property. The fundamental mechanism of colossal permittivity is reported and, using CaCu <subscript>3</subscript> Ti <subscript>4</subscript> O <subscript>12</subscript> as an example, it is attributed to the formation of an unusual metallic interface between the grain and grain boundary materials (CaCu <subscript>3</subscript> Ti <subscript>4</subscript> O <subscript>12</subscript> and Cu <subscript>x</subscript> O (x = 1, 2), respectively), not created by oxygen vacancies as is normally the case in oxide materials. This metallic layer around the grain forms confined shells of charge that pool on one side when under an applied field, which results in colossal permittivity. A route towards enhancing colossal permittivity is explained by means of manipulating the interface properties, as well as altering sample geometries. A methodology to artificially engineer colossal permittivity metamaterials is also shown.<br /> (© 2019 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)

Details

Language :
English
ISSN :
1521-4095
Volume :
31
Issue :
51
Database :
MEDLINE
Journal :
Advanced materials (Deerfield Beach, Fla.)
Publication Type :
Academic Journal
Accession number :
31631435
Full Text :
https://doi.org/10.1002/adma.201904746