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Solvent-Engineered Stress in Nanoscale Materials.

Authors :
Mills S
Rotella C
McCarthy EK
Hill DJ
Wang JJ
Donegan JF
Cahoon JF
Sader JE
Boland JJ
Source :
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2018 Dec 19; Vol. 10 (50), pp. 44183-44189. Date of Electronic Publication: 2018 Dec 04.
Publication Year :
2018

Abstract

Nanoscale materials are frequently coated with surface stabilization layers during growth that prevent flocculation in solution and facilitate processing technologies such as ink-jet device printing. Here, we show that few-nanometer-thick stabilization layers typically used swell in the presence of certain solvents and impart significant stresses to the nanomaterial that remains even after the solvent has evaporated. Solvent swelling of the surface layer dramatically enhances nanomaterial-substrate adhesion via the collapse of the stabilization layer during solvent evaporation, preventing stress relaxation. We demonstrate the stress modulation of Ag, Au, and Si nanowires functionalised with surface polymers and surfactant layers and detect strain levels between 0.1 and 0.6% using atomic force microscopy mechanical measurement and Raman spectroscopy. Dry-transferred nanowires exhibit poor adhesion and show no evidence of incorporated stress but become stressed immediately following solvent exposure. Strain engineering is demonstrated by coating nanowires with few-nanometer-thick solvent-responsive polymer layers.

Details

Language :
English
ISSN :
1944-8252
Volume :
10
Issue :
50
Database :
MEDLINE
Journal :
ACS applied materials & interfaces
Publication Type :
Academic Journal
Accession number :
30460845
Full Text :
https://doi.org/10.1021/acsami.8b17201