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Fine electron biprism on a Si-on-insulator chip for off-axis electron holography.

Authors :
Duchamp M
Girard O
Pozzi G
Soltner H
Winkler F
Speen R
Dunin-Borkowski RE
Cooper D
Source :
Ultramicroscopy [Ultramicroscopy] 2018 Feb; Vol. 185, pp. 81-89. Date of Electronic Publication: 2017 Nov 22.
Publication Year :
2018

Abstract

Off-axis electron holography allows both the amplitude and the phase shift of an electron wavefield propagating through a specimen in a transmission electron microscope to be recovered. The technique requires the use of an electron biprism to deflect an object wave and a reference wave to form an interference pattern. Here, we introduce an approach based on semiconductor processing technology to fabricate fine electron biprisms with rectangular cross-sections. By performing electrostatic calculations and preliminary experiments, we demonstrate that such biprisms promise improved performance for electron holography experiments.<br /> (Copyright © 2017 The Authors. Published by Elsevier B.V. All rights reserved.)

Details

Language :
English
ISSN :
1879-2723
Volume :
185
Database :
MEDLINE
Journal :
Ultramicroscopy
Publication Type :
Academic Journal
Accession number :
29223803
Full Text :
https://doi.org/10.1016/j.ultramic.2017.11.012