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Allergic contact dermatitis caused by (meth)acrylates in long-lasting nail polish - are we facing a new epidemic in the beauty industry?
- Source :
-
Contact dermatitis [Contact Dermatitis] 2017 Dec; Vol. 77 (6), pp. 360-366. Date of Electronic Publication: 2017 Jun 27. - Publication Year :
- 2017
-
Abstract
- Background: Allergic contact dermatitis (ACD) caused by (meth)acrylates has been described both in occupational and in non-occupational settings.<br />Objectives: To evaluate the clinical patterns, the most frequent allergens and the prognosis in patients sensitized to (meth)acrylates in long-lasting nail polish.<br />Methods: The files of patients with ACD caused by (meth)acrylates in long-lasting nail polish diagnosed between January 2013 and June 2016 in four dermatology departments in Spain were reviewed. Patients were followed up by telephone interview.<br />Results: Overall, 2353 patients were patch tested. Forty-three (1.82%) were diagnosed with ACD caused by (meth)acrylates in long-lasting nail polish during that period; all were female, and all had hand dermatitis. Patients were mostly less than 40 years old (72.1%), non-atopic (95.4%) and had an occupational cause of their dermatitis (93%), which developed ∼10.1 months after they had started to use this technique. The most frequent positive allergens were: 2-hydroxypropyl methacrylate, 2-hydroxyethyl methacrylate, and tetrahydrofurfuryl methacrylate. Eight of the 22 interviewed patients were able to improve their working technique and used 4H® protective material (fingerstalls/gloves).<br />Conclusions: Long-lasting nail polishes have become widespread, and it is a matter of concern that we may be facing a new epidemic of ACD caused by these. Policies regulating their use are urgently needed.<br /> (© 2017 John Wiley & Sons A/S. Published by John Wiley & Sons Ltd.)
Details
- Language :
- English
- ISSN :
- 1600-0536
- Volume :
- 77
- Issue :
- 6
- Database :
- MEDLINE
- Journal :
- Contact dermatitis
- Publication Type :
- Academic Journal
- Accession number :
- 28656588
- Full Text :
- https://doi.org/10.1111/cod.12827