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Thermally Induced Silane Dehydrocoupling on Silicon Nanostructures.

Authors :
Kim D
Joo J
Pan Y
Boarino A
Jun YW
Ahn KH
Arkles B
Sailor MJ
Source :
Angewandte Chemie (International ed. in English) [Angew Chem Int Ed Engl] 2016 May 23; Vol. 55 (22), pp. 6423-7. Date of Electronic Publication: 2016 Apr 21.
Publication Year :
2016

Abstract

Organic trihydridosilanes can be grafted to hydrogen-terminated porous Si nanostructures with no catalyst. The reaction proceeds efficiently at 80 °C, and it shows little sensitivity to air or water impurities. The modified surfaces are stable to corrosive aqueous solutions and common organic solvents. Octadecylsilane H3 Si(CH2 )17 CH3 , and functional silanes H3 Si(CH2 )11 Br, H3 Si(CH2 )9 CH=CH2 , and H3 Si(CH2 )2 (CF2 )5 CF3 are readily grafted. When performed on a mesoporous Si wafer, the perfluoro reagent yields a superhydrophobic surface (contact angle 151°). The bromo-derivative is converted to azide, amine, or alkyne functional surfaces via standard transformations, and the utility of the method is demonstrated by loading of the antibiotic ciprofloxaxin (35 % by mass). When intrinsically photoluminescent porous Si films or nanoparticles are used, photoluminescence is retained in the grafted products, indicating that the chemistry does not introduce substantial nonradiative surface traps.<br /> (© 2016 The Authors. Published by Wiley-VCH Verlag GmbH & Co. KGaA.)

Details

Language :
English
ISSN :
1521-3773
Volume :
55
Issue :
22
Database :
MEDLINE
Journal :
Angewandte Chemie (International ed. in English)
Publication Type :
Academic Journal
Accession number :
27101022
Full Text :
https://doi.org/10.1002/anie.201601010