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Photopatterning of Indomethacin Thin Films: a Solvent-Free Vapor-Deposited Photoresist.
- Source :
-
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2015 Oct 28; Vol. 7 (42), pp. 23398-401. Date of Electronic Publication: 2015 Oct 19. - Publication Year :
- 2015
-
Abstract
- We report indomethacin as a photoresist that can be dry-deposited (as well as spin-coated), and developed in weak aqueous base. This is the first reported patterning of indomethacin as a resist material. Nanometer-scale patterns were achieved through DUV photolithography and the underlying patterning mechanism was investigated.
Details
- Language :
- English
- ISSN :
- 1944-8252
- Volume :
- 7
- Issue :
- 42
- Database :
- MEDLINE
- Journal :
- ACS applied materials & interfaces
- Publication Type :
- Academic Journal
- Accession number :
- 26406303
- Full Text :
- https://doi.org/10.1021/acsami.5b05361