Non-inferiority of pulsed xenon UV light versus bleach for reducing environmental Clostridium difficile contamination on high-touch surfaces in Clostridium difficile infection isolation rooms.

MLA

Ghantoji, Shashank S., et al. “Non-Inferiority of Pulsed Xenon UV Light versus Bleach for Reducing Environmental Clostridium Difficile Contamination on High-Touch Surfaces in Clostridium Difficile Infection Isolation Rooms.” Journal of Medical Microbiology, vol. 64, no. Pt 2, Feb. 2015, pp. 191–94. EBSCOhost, https://doi.org/10.1099/jmm.0.000004-0.

APA

Ghantoji, S. S., Stibich, M., Stachowiak, J., Cantu, S., Adachi, J. A., Raad, I. I., & Chemaly, R. F. (2015). Non-inferiority of pulsed xenon UV light versus bleach for reducing environmental Clostridium difficile contamination on high-touch surfaces in Clostridium difficile infection isolation rooms. Journal of Medical Microbiology, 64(Pt 2), 191–194. https://doi.org/10.1099/jmm.0.000004-0

Chicago

Ghantoji, Shashank S, Mark Stibich, Julie Stachowiak, Sherry Cantu, Javier A Adachi, Issam I Raad, and Roy F Chemaly. 2015. “Non-Inferiority of Pulsed Xenon UV Light versus Bleach for Reducing Environmental Clostridium Difficile Contamination on High-Touch Surfaces in Clostridium Difficile Infection Isolation Rooms.” Journal of Medical Microbiology 64 (Pt 2): 191–94. doi:10.1099/jmm.0.000004-0.