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Electron attachment to the dipeptide dialanine: influence of methylation on site selective dissociation reactions.

Authors :
Puschnigg B
Huber SE
Probst M
Tanzer K
Vizcaino V
Ferreira da Silva F
Scheier P
Limão-Vieira P
Denifl S
Source :
Physical chemistry chemical physics : PCCP [Phys Chem Chem Phys] 2013 Mar 21; Vol. 15 (11), pp. 3834-40.
Publication Year :
2013

Abstract

Gas phase dissociative electron attachment (DEA) measurements with methyl-dialanine, C(7)H(14)N(2)O(3), are performed in a crossed electron-molecular beam experiment at high energy resolution (∼120 meV). Anion efficiency yields as a function of the incident electron energy are obtained for the most abundant fragments up to electron energies of ∼15 eV. There is no evidence of molecular anion formation whereas the dehydrogenated closed shell anion (M-H)(-) is one of the most dominant reaction products. Quantum chemical calculations are performed to investigate the electron attachment process and to elucidate site selective bond cleavage in the (M-H)(-) DEA-channel. Previous DEA studies on dialanine have shown that (M-H)(-) formation proceeds through abstraction of a hydrogen atom from the carboxyl and amide groups, contributing to two distinct resonances at 0.81 and 1.17 eV, respectively [D. Gschliesser, V. Vizcaino, M. Probst, P. Scheier and S. Denifl, Chem.-Eur. J., 2012, 18, 4613-4619]. Here we show that by methylation of the carboxyl group, all (calculated) thresholds for H-loss from the different sites in the dialanine molecule are shifted up to a maximum of 1.4 eV. The lowest lying resonance observed experimentally for (M-H)(-) remains operative from the amide group at the electron energy of 2.4 eV due to the methylation. We further study methylation-induced effects on the unimolecular dissociation leading to a variety of negatively charged DEA products.

Details

Language :
English
ISSN :
1463-9084
Volume :
15
Issue :
11
Database :
MEDLINE
Journal :
Physical chemistry chemical physics : PCCP
Publication Type :
Academic Journal
Accession number :
23400048
Full Text :
https://doi.org/10.1039/c3cp44230f