Patterning of TiO2 particles on poly(dimethyl siloxane) films by using proton irradiation and liquid-phase deposition process.

Micropatterning of titanium dioxide (TiO2) on the surface of thin poly(dimethyl siloxane) (PDMS) films was described by means of proton irradiation and liquid-phase deposition (LPD) techniques. The surface of thin PDMS films was irradiated with accelerated proton ions through a pattern mask in the absence or presence of oxygen in order to create hydrophilically/hydrophobically patterned surfaces. The results of the surface analysis revealed that the PDMS films irradiated at the fluence of 1 x 10(15) ions cm-2 in the presence of oxygen showed the highest hydrophilicity. The LPD of TiO2 particles on the patterned PDMS film surface showed a selective deposition of TiO2 on the irradiated regions, leading to well defined TiO2 micropatterns. The crystal structure of the formed TiO2 films was found to be in an anatase phase by X-ray diffraction analysis. This process can be applied for patterning various metal and metal oxide particles on a polymer substrate.