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Nanoscale three-dimensional patterning of molecular resists by scanning probes.

Authors :
Pires D
Hedrick JL
De Silva A
Frommer J
Gotsmann B
Wolf H
Despont M
Duerig U
Knoll AW
Source :
Science (New York, N.Y.) [Science] 2010 May 07; Vol. 328 (5979), pp. 732-5. Date of Electronic Publication: 2010 Apr 22.
Publication Year :
2010

Abstract

For patterning organic resists, optical and electron beam lithography are the most established methods; however, at resolutions below 30 nanometers, inherent problems result from unwanted exposure of the resist in nearby areas. We present a scanning probe lithography method based on the local desorption of a glassy organic resist by a heatable probe. We demonstrate patterning at a half pitch down to 15 nanometers without proximity corrections and with throughputs approaching those of Gaussian electron beam lithography at similar resolution. These patterns can be transferred to other substrates, and material can be removed in successive steps in order to fabricate complex three-dimensional structures.

Details

Language :
English
ISSN :
1095-9203
Volume :
328
Issue :
5979
Database :
MEDLINE
Journal :
Science (New York, N.Y.)
Publication Type :
Academic Journal
Accession number :
20413457
Full Text :
https://doi.org/10.1126/science.1187851