SiO2-based nonplanar structures fabricated using femtosecond laser lithography.

SiO2-based hybrid diffractive-refractive microlenses were fabricated by femtosecond laser lithography-assisted micromachining, which is a combined process of nonlinear lithography and plasma etching. The high-aspect-ratio patterns of resist were formed by laser exposure without translating the laser spot. By scanning this rod three-dimensionally, micro-Fresnel lens patterns were written directly inside resists on the convex lenses. Then, the resist patterns were transferred to the underlying lenses by CHF(3) plasma. We obtained SiO2 nonplanar structures with smooth surfaces. This hybridization shifted the focal length of the lens by 216 microm, which was consistent with theoretical value.