The chemical vapor deposition of nickel phosphide or selenide thin films from a single precursor.

MLA

Panneerselvam, Arunkumar, et al. “The Chemical Vapor Deposition of Nickel Phosphide or Selenide Thin Films from a Single Precursor.” Journal of the American Chemical Society, vol. 130, no. 8, Feb. 2008, pp. 2420–21. EBSCOhost, https://doi.org/10.1021/ja078202j.

APA

Panneerselvam, A., Malik, M. A., Afzaal, M., O’Brien, P., & Helliwell, M. (2008). The chemical vapor deposition of nickel phosphide or selenide thin films from a single precursor. Journal of the American Chemical Society, 130(8), 2420–2421. https://doi.org/10.1021/ja078202j

Chicago

Panneerselvam, Arunkumar, Mohammad A Malik, Mohammad Afzaal, Paul O’Brien, and Madeleine Helliwell. 2008. “The Chemical Vapor Deposition of Nickel Phosphide or Selenide Thin Films from a Single Precursor.” Journal of the American Chemical Society 130 (8): 2420–21. doi:10.1021/ja078202j.