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Response to vocational rehabilitation during treatment with first- or second-generation antipsychotics.

Authors :
Bond GR
Kim HW
Meyer PS
Gibson PJ
Tunis S
Evans JD
Lysaker P
McCoy ML
Dincin J
Xie H
Source :
Psychiatric services (Washington, D.C.) [Psychiatr Serv] 2004 Jan; Vol. 55 (1), pp. 59-66.
Publication Year :
2004

Abstract

Objective: Second-generation antipsychotics may enhance the rehabilitation of individuals with schizophrenia. The authors hypothesized that clients receiving second-generation antipsychotics would use vocational rehabilitation services more effectively and would have better employment outcomes than those receiving first-generation antipsychotics.<br />Methods: Ninety unemployed clients with schizophrenia and related disorders who were beginning a vocational rehabilitation program were followed for nine months. Three groups were defined according to the medication in use at study entry: olanzapine (N=39), risperidone (N=27), or first-generation antipsychotics only (N=24). Participants were interviewed monthly.<br />Results: The olanzapine and risperidone groups did not differ on any employment outcomes. On most vocational indicators, clients receiving second-generation agents did not differ from those receiving first-generation agents. However, at nine months the second-generation group had a significantly higher rate of participation in vocational training; a trend was found toward a higher rate of paid employment. All groups showed substantial improvement in employment outcomes after entering a vocational program.<br />Conclusions: The hypothesis that second-generation antipsychotics promote better employment outcomes than first-generation antipsychotics was not upheld. However, second-generation agents appear to be associated with increased participation in vocational rehabilitation.

Details

Language :
English
ISSN :
1075-2730
Volume :
55
Issue :
1
Database :
MEDLINE
Journal :
Psychiatric services (Washington, D.C.)
Publication Type :
Academic Journal
Accession number :
14699202
Full Text :
https://doi.org/10.1176/appi.ps.55.1.59