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Electrochemical behavior of hydroxyapatite/TiN multi-layer coatings on Ti alloys.

Authors :
Kim, Eun-Ju
Jeong, Yong-Hoon
Choe, Han-Cheol
Brantley, William A.
Source :
Thin Solid Films. Dec2014, Vol. 572, p113-118. 6p.
Publication Year :
2014

Abstract

The electrochemical behavior of hydroxyapatite (HA) and titanium nitride (TiN) multi-layer coatings on Ti–Nb–Zr alloys was investigated by a variety of surface analytical methods. The HA/TiN layers were deposited using a magnetron sputtering system. The HA target was made of human tooth-ash sintered at 1300 °C for 1 h and had an average Ca/P ratio of 1.9. From X-ray diffraction patterns, the Ti–29Nb–5Zr alloy was composed entirely of equiaxed β-phase exhibiting the principal (110) reflection, and the coating exhibited the (111) and (200) reflections for TiN and the (112) and (202) reflections for HA. At the coating surface the HA films consisted of granular particles, and the surface roughness was 4.22 nm. The thickness of the coating layers increased in the order of HA/TiN (lowest), TiN, and HA (highest). Potentiodynamic polarization measurements revealed that the corrosion current density was the lowest, and the corrosion potential and polarization resistance the highest, when the Ti–29Nb–5Zr surface was covered by the HA/TiN film, compared to solely HA or TiN films. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00406090
Volume :
572
Database :
Academic Search Index
Journal :
Thin Solid Films
Publication Type :
Academic Journal
Accession number :
99897363
Full Text :
https://doi.org/10.1016/j.tsf.2014.08.035