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Negative differential resistance in GaN tunneling hot electron transistors.

Authors :
Zhichao Yang
Nath, Digbijoy
Rajan, Siddharth
Source :
Applied Physics Letters. 11/17/2014, Vol. 105 Issue 20, p1-4. 3p. 1 Color Photograph, 4 Graphs.
Publication Year :
2014

Abstract

Room temperature negative differential resistance is demonstrated in a unipolar GaN-based tunneling hot electron transistor. Such a device employs tunnel-injected electrons to vary the electron energy and change the fraction of reflected electrons, and shows repeatable negative differential resistance with a peak to valley current ratio of 7.2. The device was stable when biased in the negative resistance regime and tunable by changing collector bias. Good repeatability and double-sweep characteristics at room temperature show the potential of such device for high frequency oscillators based on quasi-ballistic transport. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
105
Issue :
20
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
99609356
Full Text :
https://doi.org/10.1063/1.4900780