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Self-organized anisotropic (Zr1−xSix)Ny nanocomposites grown by reactive sputter deposition.

Authors :
Ghafoor, Naureen
Petrov, Ivan
Klenov, Dmitri O.
Freitag, Bert
Jensen, Jens
Greene, J.E.
Hultman, Lars
Odén, Magnus
Source :
Acta Materialia. Jan2015, Vol. 82, p179-189. 11p.
Publication Year :
2015

Abstract

The physical properties of hard and superhard nanocomposite thin films are strongly dependent on their nanostructure. Here, we present the results of an investigation of nanostructural evolution and the resulting mechanical properties of (Zr 1− x Si x )N y films, with 0 ⩽ x ⩽ 1 and 1 ⩽ y ⩽ 1.27, grown on MgO(0 0 1) and Al 2 O 3 (0 0 0 1) substrates at temperatures T s = 500–900 °C by reactive magnetron sputter deposition from Zr and Si targets. X-ray diffraction and transmission electron microscopy (TEM) results show that there is a T s /composition window in which stoichiometric Zr–Si–N and amorphous a-Si 3 N 4 phases mutually segregate and self-organize into encapsulated 3–5 nm wide ZrN-rich (Zr 1− x Si x )N columns which extend along the growth direction with a strong (0 0 2) texture. Lattice-resolved scanning TEM and energy-dispersive X-ray spectroscopy reveal that the (Zr 1− x Si x )N y nanocolumns are separated by a bilayer tissue phase consisting of a thin crystalline SiN y -rich (Zr 1− x Si x )N y layer with an a-Si 3 N 4 overlayer. Incorporation of metastable SiN into NaCl-structure ZrN leads to an enhanced nanoindentation hardness H which is a function of T s and film composition. For nanocomposites with composition (Zr 0.8 Si 0.2 )N 1.14 (10 at.% Si) H, increases from 26 GPa at 500 °C to 37 GPa at 900 °C. For comparison, the hardness of epitaxial ZrN/MgO(0 0 1) layers grown at T s = 800 °C is 24 GPa. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
13596454
Volume :
82
Database :
Academic Search Index
Journal :
Acta Materialia
Publication Type :
Academic Journal
Accession number :
99512464
Full Text :
https://doi.org/10.1016/j.actamat.2014.09.029