Cite
Ultra-thin Cr2O3 well-crystallized films for high transmittance APSM in ArF line
MLA
Lai, F. D., et al. “Ultra-Thin Cr2O3 Well-Crystallized Films for High Transmittance APSM in ArF Line.” Microelectronic Engineering, vol. 67/68, June 2003, p. 17. EBSCOhost, https://doi.org/10.1016/S0167-9317(03)00179-5.
APA
Lai, F. D., Huang, C. Y., Chang, C. M., Wang, L. A., & Cheng, W. C. (2003). Ultra-thin Cr2O3 well-crystallized films for high transmittance APSM in ArF line. Microelectronic Engineering, 67/68, 17. https://doi.org/10.1016/S0167-9317(03)00179-5
Chicago
Lai, F.D., C.Y. Huang, C.M. Chang, L.A. Wang, and W.C. Cheng. 2003. “Ultra-Thin Cr2O3 Well-Crystallized Films for High Transmittance APSM in ArF Line.” Microelectronic Engineering 67/68 (June): 17. doi:10.1016/S0167-9317(03)00179-5.