Control of preferential orientation by in situ plasma supply during growth of polycrystalline silicon films.

MLA

Hasegawa, S., et al. “Control of Preferential Orientation by in Situ Plasma Supply during Growth of Polycrystalline Silicon Films.” Applied Physics Letters, vol. 55, no. 2, July 1989, p. 142. EBSCOhost, https://doi.org/10.1063/1.102126.

APA

Hasegawa, S., Yamamoto, S., & Kurata, Y. (1989). Control of preferential orientation by in situ plasma supply during growth of polycrystalline silicon films. Applied Physics Letters, 55(2), 142. https://doi.org/10.1063/1.102126

Chicago

Hasegawa, S., S. Yamamoto, and Y. Kurata. 1989. “Control of Preferential Orientation by in Situ Plasma Supply during Growth of Polycrystalline Silicon Films.” Applied Physics Letters 55 (2): 142. doi:10.1063/1.102126.