Cite
Enhanced Sb diffusion in Si under thermal Si3N4 films during annealing in Ar.
MLA
Ahn, S. T., et al. “Enhanced Sb Diffusion in Si under Thermal Si3N4 Films during Annealing in Ar.” Applied Physics Letters, vol. 53, no. 17, Oct. 1988, p. 1593. EBSCOhost, https://doi.org/10.1063/1.100439.
APA
Ahn, S. T., Kennel, H. W., Plummer, J. D., & Tiller, W. A. (1988). Enhanced Sb diffusion in Si under thermal Si3N4 films during annealing in Ar. Applied Physics Letters, 53(17), 1593. https://doi.org/10.1063/1.100439
Chicago
Ahn, S. T., H. W. Kennel, J. D. Plummer, and W. A. Tiller. 1988. “Enhanced Sb Diffusion in Si under Thermal Si3N4 Films during Annealing in Ar.” Applied Physics Letters 53 (17): 1593. doi:10.1063/1.100439.