Metal-oxide-semiconductor characteristics of rapid thermal nitrided thin oxides.

MLA

Shih, D. K., et al. “Metal-Oxide-Semiconductor Characteristics of Rapid Thermal Nitrided Thin Oxides.” Applied Physics Letters, vol. 52, no. 20, May 1988, p. 1698. EBSCOhost, https://doi.org/10.1063/1.99710.

APA

Shih, D. K., Chang, W. T., Lee, S. K., Ku, Y. H., Kwong, D. L., & Lee, S. (1988). Metal-oxide-semiconductor characteristics of rapid thermal nitrided thin oxides. Applied Physics Letters, 52(20), 1698. https://doi.org/10.1063/1.99710

Chicago

Shih, D. K., W. T. Chang, S. K. Lee, Y. H. Ku, D. L. Kwong, and S. Lee. 1988. “Metal-Oxide-Semiconductor Characteristics of Rapid Thermal Nitrided Thin Oxides.” Applied Physics Letters 52 (20): 1698. doi:10.1063/1.99710.