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NpnN double-heterojunction bipolar transistor on InGaAsP/InP.

Authors :
Su, L. M.
Grote, N.
Kaumanns, R.
Schroeter, H.
Source :
Applied Physics Letters. 7/1/1985, Vol. 47 Issue 1, p28. 3p.
Publication Year :
1985

Abstract

Double-heterojunction bipolar transistors have been fabricated on InGaAs(P)/InP with current gains of up to 200. Transistors with a p+-InGaAs/N-InP base/collector junction exhibited drastic gain reduction at low collector bias voltages which is ascribed to the electron repelling effect of the conduction-band spike formed at the collector heterojunction. To overcome this complication a thin n-InGaAs transition layer was inserted between the ternary base and the InP wide-gap collector. The resulting nN double-layer collector structure leads to excellent current/voltage characteristics. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
47
Issue :
1
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
9817765
Full Text :
https://doi.org/10.1063/1.96392